Published December 2013 | Version v1
Journal article

Resistive switching phenomena of tungsten nitride thin films with excellent CMOS compatibility

Description

Graphical abstract: - Highlights: • The resistive switching characteristics of WNx thin films. • Excellent CMOS compatibility WNx films as a resistive switching material. • Resistive switching mechanism revealed trap-controlled space charge limited conduction. • Good endurance and retention properties over 105 cycles, and 105 s, respectively - Abstract: We report the resistive switching (RS) characteristics of tungsten nitride (WNx) thin films with excellent complementary metal-oxide-semiconductor (CMOS) compatibility. A Ti/WNx/Pt memory cell clearly shows bipolar RS behaviors at a low voltage of approximately ±2.2 V. The dominant conduction mechanisms at low and high resistance states were verified by Ohmic behavior and trap-controlled space-charge-limited conduction, respectively. A conducting filament model by a redox reaction explains the RS behavior in WNx films. We also demonstrate the memory characteristics during pulse operation, including a high endurance over >105 cycles and a long retention time of >105 s

Availability note (English)

Available from http://dx.doi.org/10.1016/j.materresbull.2013.05.073

Additional details

Identifiers

DOI
10.1016/j.materresbull.2013.05.073;
PII
S0025-5408(13)00452-2;

Publishing Information

Journal Title
Materials Research Bulletin
Journal Volume
48
Journal Issue
12
Journal Page Range
p. 5080-5083
ISSN
0025-5408
CODEN
MRBUAC

Conference

Title
5. international symposium on functional materials
Acronym
ISFM 2012
Dates
17-20 Dec 2012
Place
Perth, WA (Australia)

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.