Resistive switching phenomena of tungsten nitride thin films with excellent CMOS compatibility
Description
Graphical abstract: - Highlights: • The resistive switching characteristics of WNx thin films. • Excellent CMOS compatibility WNx films as a resistive switching material. • Resistive switching mechanism revealed trap-controlled space charge limited conduction. • Good endurance and retention properties over 105 cycles, and 105 s, respectively - Abstract: We report the resistive switching (RS) characteristics of tungsten nitride (WNx) thin films with excellent complementary metal-oxide-semiconductor (CMOS) compatibility. A Ti/WNx/Pt memory cell clearly shows bipolar RS behaviors at a low voltage of approximately ±2.2 V. The dominant conduction mechanisms at low and high resistance states were verified by Ohmic behavior and trap-controlled space-charge-limited conduction, respectively. A conducting filament model by a redox reaction explains the RS behavior in WNx films. We also demonstrate the memory characteristics during pulse operation, including a high endurance over >105 cycles and a long retention time of >105 s
Availability note (English)
Available from http://dx.doi.org/10.1016/j.materresbull.2013.05.073Additional details
Identifiers
- DOI
- 10.1016/j.materresbull.2013.05.073;
- PII
- S0025-5408(13)00452-2;
Publishing Information
- Journal Title
- Materials Research Bulletin
- Journal Volume
- 48
- Journal Issue
- 12
- Journal Page Range
- p. 5080-5083
- ISSN
- 0025-5408
- CODEN
- MRBUAC
Conference
- Title
- 5. international symposium on functional materials
- Acronym
- ISFM 2012
- Dates
- 17-20 Dec 2012
- Place
- Perth, WA (Australia)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45111828
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COMPATIBILITY; CURIUM OXIDES; ELECTRICAL PROPERTIES; REDOX REACTIONS; SPUTTERING; THIN FILMS; TUNGSTEN; TUNGSTEN NITRIDES; X-RAY DIFFRACTION
- Descriptors DEC
- ACTINIDE COMPOUNDS; CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; CURIUM COMPOUNDS; DIFFRACTION; ELEMENTS; FILMS; METALS; NITRIDES; NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; REFRACTORY METAL COMPOUNDS; REFRACTORY METALS; SCATTERING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; TRANSPLUTONIUM COMPOUNDS; TRANSURANIUM COMPOUNDS; TUNGSTEN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.