Published December 7, 2015 | Version v1
Journal article

Suppression of low-frequency charge noise in gates-defined GaAs quantum dots

  • 1. Synergetic Innovation Center of Quantum Information and Quantum Physics, University of Science and Technology of China, Hefei, Anhui 230026 (China)
  • 2. Key Laboratory of Quantum Information, Chinese Academy of Sciences, University of Science and Technology of China, Hefei, Anhui 230026 (China)

Description

To reduce the charge noise of a modulation-doped GaAs/AlGaAs quantum dot, we have fabricated shallow-etched GaAs/AlGaAs quantum dots using the wet-etching method to study the effects of two-dimensional electron gas (2DEG) underneath the metallic gates. The low-frequency 1/f noise in the Coulomb blockade region of the shallow-etched quantum dot is compared with a non-etched quantum dot on the same wafer. The average values of the gate noise are approximately 0.5 μeV in the shallow-etched quantum dot and 3 μeV in the regular quantum dot. Our results show the quantum dot low-frequency charge noise can be suppressed by the removal of the 2DEG underneath the metallic gates, which provides an architecture for noise reduction

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
107
Journal Issue
23
Journal Page Range
p. 233104-233104.4
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47056187
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
ALUMINIUM ARSENIDES; DOPED MATERIALS; GALLIUM ARSENIDES; MODULATION; NOISE; QUANTUM DOTS; TWO-DIMENSIONAL SYSTEMS
Descriptors DEC
ALUMINIUM COMPOUNDS; ARSENIC COMPOUNDS; ARSENIDES; CRYSTAL LATTICES; CRYSTAL STRUCTURE; GALLIUM COMPOUNDS; MATERIALS; NANOSTRUCTURES; PNICTIDES

Optional Information

Notes
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