Published November 2020 | Version v1
Journal article

Development of XFEL nano-focusing technique and applications

  • 1. Japan Synchrotron Radiation Research Institute, Sayo, Hyogo (Japan)

Description

In X-ray Free Electron Laser (XFEL) facility SACLA, nano-focusing systems produce intense XFEL pulses with intensities of the order of 1020W/cm2. Such intense XFEL pulses are utilized not only as a conventional probe, but also as a pump source, which have opened up new fields of study for X-ray nonlinear phenomena. This article reports on the nano-focusing systems and their applications such as two-photon absorption, saturable absorption, XFEL-pumped Kα laser, and femtosecond X-ray damage. Moreover, the current status of development of a sub-10 nm focusing system toward intensity of 1022W/cm2 is described. (author)

Abstract (Japanese)

X線自由電子レーザー(XFEL)施設SACLAでは,ナノ集光技術の開発により1020W/cm2という極めて高強度のXFELパルスの利用が可能となり,この高強度XFELを励起光として用いた研究が盛んに行われている。本稿では,ナノ集光技術とその利用研究の成果について報告する。更に,1022W/cm2という未到のX線強度を目指したsub-10nm集光光学系開発の現状を紹介する。(著者)

Additional details

Additional titles

Original title (Japanese)
XFELナノ集光技術開発とその応用

Publishing Information

Journal Title
Hoshako
Journal Volume
33
Journal Issue
6
Series
雑誌名:放射光
Journal Page Range
p. 365-372
ISSN
0914-9287

Optional Information

Notes
35 refs., 8 figs.