Published January 1, 2021
| Version v1
Journal article
Production of porous films of silicate glass using a plasma focus setup
- 1. A.A. Baikov Institute of Metallurgy and Materials Science of RAS, Leninsky pr., 49, Moscow (Russian Federation)
- 2. P.N. Lebedev Physical Institute of RAS, Leninsky pr., 53, Moscow (Russian Federation)
Description
The aim of the work was to obtain and study films of porous silicate glass. The proposed method for producing porous films is based on the rapid cooling of the melt on the surface of a glass plate after exposure to short pulses of argon plasma generated on an electrodischarge installation of plasma focus type. Silicate glass films obtained by such method have the properties of both porous glasses and foam glass. The specific volume density of these films is ∼ 0.4 g/cm3, their porosity and hygroscopicity correspondingly ∼ 0.3 and ∼ 30% (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/1758/1/012016Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 1758
- Journal Issue
- 1
- Journal Page Range
- [5 p.]
- ISSN
- 1742-6596
Conference
- Title
- 8. International Conference on unctional Nanomaterials and High-Purity Substances FNM
- Dates
- 5-9 Oct 2020
- Place
- Suzdal (Russian Federation)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54032944
- Subject category
- S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON; COOLING; DENSITY; FOAMS; GLASS; HYGROSCOPICITY; INSTALLATION; PLASMA FOCUS; PLATES; POROSITY; POROUS MATERIALS; PULSES; SILICATES; SURFACES; THIN FILMS
- Descriptors DEC
- COLLOIDS; DISPERSIONS; ELEMENTS; FILMS; FLUIDS; GASES; MATERIALS; NONMETALS; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RARE GASES; SILICON COMPOUNDS