Published December 2013 | Version v1
Journal article

Theory for the self-bias formation in capacitively coupled plasmas excited by arbitrary waveforms

  • 1. LPP-CNRS, Ecole Polytechnique, 91128 Palaiseau (France)
  • 2. School of Physical Sciences and National Centre for Plasma Science and Technology, Dublin City University, Dublin 9 (Ireland)

Description

We develop a semi-analytical theory for the self-bias formation in capacitively coupled plasmas excited by arbitrary radio-frequency (rf) waveforms. The requirement of rf current continuity and voltage balance across the discharge results in the need for a self-bias voltage to develop with non-sinusoidal excitations, even in geometrically symmetric systems. The theory is compared extensively with a wide range of experimental and particle-in-cell (PIC) simulation data within the literature, and is found to be in excellent agreement. Furthermore, it is shown that the present theory is formally equivalent to the original model proposed by Heil et al (2008 J. Phys. D: Appl. Phys. 41 165202), but goes further by explicitly allowing the time-varying sheath voltages and symmetry parameter to be evaluated without input from PIC simulations. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0963-0252/22/6/065013

Additional details

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
22
Journal Issue
6
Journal Page Range
[11 p.]
ISSN
0963-0252

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46067823
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
COMPARATIVE EVALUATIONS; COMPUTERIZED SIMULATION; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; EXCITATION; PLASMA; PLASMA SHEATH; PLASMA SIMULATION; RADIOWAVE RADIATION; SYMMETRY; WAVE FORMS
Descriptors DEC
ELECTROMAGNETIC RADIATION; ENERGY-LEVEL TRANSITIONS; EVALUATION; RADIATIONS; SIMULATION