Published May 1989
| Version v1
Journal article
Surface properties of gallium arsenides after low-energy ion bombardment
- 1. Moskovskij Inst. Ehlektronnoj Tekhniki, Moscow (USSR)
Description
Complex investigation of changes in GaAs surface layer composition, structure and electrical properties under the effect of argon low energy (50-150 eV) ion beams and chemically active gases is conducted
Additional details
Additional titles
- Original title (Russian)
- Свойства поверхности арсенида галлия, облученной низкоэнергетичными ионами
Publishing Information
- Journal Title
- Mikroehlektronika
- Journal Volume
- 18
- Journal Issue
- 3
- Series
- Mikroehlektronika.
- Journal Page Range
- 236-240
- ISSN
- 0544-1269
- CODEN
- MKETA
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- USSR
- INIS RN
- 22011562
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ARGON IONS; CHEMICAL COMPOSITION; EV RANGE 10-100; EV RANGE 100-1000; GALLIUM ARSENIDES; ION IMPLANTATION; MICROSTRUCTURE; PHYSICAL RADIATION EFFECTS; SPATIAL DISTRIBUTION; SURFACES
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CHARGED PARTICLES; CRYSTAL STRUCTURE; DISTRIBUTION; ENERGY RANGE; EV RANGE; GALLIUM COMPOUNDS; IONS; PNICTIDES; RADIATION EFFECTS