Published 2001 | Version v1
Miscellaneous Open

Alloying of Silicon on Ti6Al4V Using High-Intensity Pulsed Plasma Beams

Creators

  • 1. Institut fuer Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf, Dresden (Germany)
  • 2. The Andrzej Soltan Institute for Nuclear Studies, Otwock-Swierk (Poland)
  • 3. Institute of Nuclear Chemistry and Technology, Warsaw (Poland)

Description

no abstract available

Files

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Part of:
Annual Report 2000

Additional details

Publishing Information

Imprint Place
Otwock-Swierk (Poland)
Imprint Title
Annual Report 2000
Imprint Pagination
198 p.
Journal Page Range
p. 156
ISSN
1232-5309
Report number
INIS-PL--0102

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
32042549
Subject category
S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Progress Report, No Abstract
Descriptors DEI
ALUMINIUM ALLOYS; METALLURGICAL EFFECTS; PLASMA ARC SPRAYING; PROGRESS REPORT; ROUGHNESS; SILICON; SUBSTRATES; SURFACE COATING; SURFACE PROPERTIES; TITANIUM ALLOYS; TITANIUM SILICIDES; VANADIUM ALLOYS; X-RAY DIFFRACTION
Descriptors DEC
ALLOYS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; DOCUMENT TYPES; ELEMENTS; SCATTERING; SEMIMETALS; SILICIDES; SILICON COMPOUNDS; SPRAY COATING; SURFACE COATING; SURFACE PROPERTIES; TITANIUM COMPOUNDS; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENT COMPOUNDS

Optional Information

Notes
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