Published November 2017 | Version v1
Journal article

Impact of electron irradiation on N- and O-enriched FZ silicon p-in-n pad radiation detectors

  • 1. CiS Forschungsinstitut fuer Mikrosensorik GmbH, Erfurt (Germany)
  • 2. Leibniz-Institut fuer Polymerforschung Dresden e.V., Dresden (Germany)
  • 3. Topsil Semiconductors sp. z o. o., Warszawa (Poland)
  • 4. Institute of Electronic Materials Technology, Warszawa (Poland)

Description

Nitrogen and oxygen enriched FZ silicon p-in-n pad radiation detectors are investigated with respect to the radiation hardness. The leakage current and the charge carrier lifetime are measured before and after 1 MeV electron irradiation. Before irradiation the leakage current was found to increase due to enrichment by nitrogen and oxygen. After the irradiation the leakage current as well as the radiation induced defect density are found to be reduced in the nitrogen and oxygen enriched samples. Hence, increased radiation hardness for the enriched FZ silicon is observed. The defect reduction efficiency of nitrogen was found to be about two orders of magnitude higher than that of oxygen. (copyright 2017 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

Availability note (English)

Available from: http://dx.doi.org/10.1002/pssc.201700019

Additional details

Identifiers

Publishing Information

Journal Title
Physica Status Solidi. C, Current Topics in Solid State Physics (Online)
Journal Volume
14
Journal Issue
11
Journal Page Range
p. 1-6
ISSN
1610-1642
CODEN
PSSCGL

Conference

Title
12. International conference on nitride semiconductors
Acronym
ICNS 12
Dates
24-28 Jul 2017
Place
Strasbourg (France)

Optional Information

Notes
With 9 figs., 2 tabs.