Published September 15, 2008 | Version v1
Journal article

Evaluation of nanoscale roughness measurements on a plasma treated SU-8 polymer surface by atomic force microscopy

  • 1. Center for NanoScience (CeNS) and Department of Earth and Environmental Sciences, Ludwig-Maximilians-Universitaet Muenchen, Theresienstrasse 41, 80333 Munich (Germany)
  • 2. Deutsches Museum, Museumsinsel 1, 80356 Munich (Germany)

Description

A comparison between roughness data obtained with an atomic force microscope (AFM) on different surfaces requires reliable roughness parameters. In order to specify the appropriate parameters for nanoscale roughness measurements, we compared the root mean square (rms) roughness and the relative surface area (sdr) as function of varying scan size, speed and pixel size. By using oxygen plasma (24 kJ) treated SU-8 with an average rms roughness of 2.6 ± 0.5 nm as reference surface, the repeatability of the method was evaluated for dynamic (tapping) and contact mode. The evaluation of AFM images indicated a decrease of the effective tip radius after a few measurements. This degradation of the tip lowers the resolution of the image and can affect roughness measurements

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2008.05.323

Additional details

Identifiers

DOI
10.1016/j.apsusc.2008.05.323;
PII
S0169-4332(08)01321-4;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
254
Journal Issue
22
Journal Page Range
p. 7290-7295
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40033690
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; COMPARATIVE EVALUATIONS; NANOSTRUCTURES; OXYGEN; PLASMA; POLYMERS; ROUGHNESS; SURFACE AREA; SURFACES
Descriptors DEC
ELEMENTS; EVALUATION; MICROSCOPY; NONMETALS; SURFACE PROPERTIES

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.