Published August 28, 1989 | Version v1
Journal article

Novel method of patterning YBaCuO superconducting thin films

  • 1. Microelectronics Sciences Laboratories and Center for Telecommunication Research, 1312 Mudd, Columbia University, New York, New York 10027 (USA)
  • 2. IBM T. J. Watson Research Center, Yorktown Heights, New York 10598

Description

A unique method of patterning YBaCuO thin films based on the inhibition of superconductivity by Si-YBaCuO intermixing has been developed. In the experiment, a thin Si film was first evaporated on a MgO substrate and subsequently patterned using laser direct-write etching. Multilayered YBaCuO thin films were then deposited by e-beam evaporation and annealed in a rapid thermal annealing system for 30--90 s at 980 degree C. The YBaCuO film deposited on the silicon regions became insulating. Auger depth profiling measurements indicate that Si-YBaCuO intermixing had occurred in these areas. Between the insulating regions, narrow YBaCuO superconducting lines were formed. For both 10-μm-wide, 1-mm-long and 2.5-μm-wide, 80-μm-long lines, the Tc was observed above 76 K. The critical current density of the lines was measured to be 300 A/cm2 at 75 K. This patterning technique may be useful for fabrication of high Tc superconducting interconnects and devices

Additional details

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
55
Journal Issue
9
Series
Appl. Phys. Lett.
Journal Page Range
896-898
ISSN
0003-6951
CODEN
APPLA