Published 2019 | Version v1
Journal article

Testing and characterization of challenging optics and optical systems with Shack Hartmann wavefront sensors

  • 1. Imagine Optic, 18 rue Charles de Gaulle 91400 Orsay (France)

Description

The Shack-Hartman wavefront sensor is a common metrology tool in the field of laser, adaptive optics and astronomy. However, this technique is still scarcely used in optics and optical system metrology. With the development of manufacturing techniques and the increasing need for optical characterization in the industry, the Shack-Hartmann wavefront sensor emerges as an efficient complementary tool to the well-established Fizeau interferometry for optical system metrology. Moreover, the raise of smart vehicles equipped with optical sensors and augmented reality, the optical characterization of glass and transparent flat materials becomes an issue that can be addressed with Shack-Hartmann sensors. Aberration measurements of challenging optics will be presented such as optical filters, thin flat optics, aspheric lenses and large optical assemblies.

Availability note (English)

Available from https://www.epj-conferences.org/articles/epjconf/pdf/2019/20/epjconf_eos18_06003.pdf; https://doaj.org/article/19850c4c07784376895d8a8a64d0d098

Additional details

Publishing Information

Journal Title
EPJ. Web of Conferences
Journal Volume
215
Journal Page Range
vp.
ISSN
2100-014X

Conference

Title
EOS Optical Technologies
Dates
24-26 Jun 2019
Place
Munich (Germany)

INIS

Country of Publication
France
Country of Input or Organization
France
INIS RN
53095569
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
GLASS; INTERFEROMETRY; LASERS; LENSES; MANUFACTURING; METROLOGY; OPTICAL FILTERS; OPTICAL SYSTEMS; OPTICS; SENSORS; TESTING; TOOLS
Descriptors DEC
EQUIPMENT; FILTERS