Published February 15, 1976 | Version v1
Journal article Metadata-only

Oxygen distribution in sputtered Nb-Ge films

Creators

  • 1. Westinghouse Research Laboratories, Pittsburgh, Pennsylvania 15235

Description

A quantiative determination of the distribution of oxygen in a high-T/subc/ (22 K) Nb-Ge film has been made using a nuclear backscattering method. The Nb/Ge ratios as a function of depth have also been determined. An apparent correlation between oxygen concentration and Nb/Ge ratio is observed

Additional details

Identifiers

DOI
10.1063/1.88711;

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
28
Journal Issue
4
Series
Appl. Phys. Lett.
Journal Page Range
237-239
ISSN
0003-6951

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
7251055
Subject category
S36: MATERIALS SCIENCE; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Descriptors DEI
BACKSCATTERING; CHEMICAL COMPOSITION; CHEMICAL PREPARATION; FILMS; GERMANIUM ALLOYS; NIOBIUM BASE ALLOYS; OXYGEN; OXYGEN ADDITIONS; RADIATION SCATTERING ANALYSIS; SPUTTERING; SUPERCONDUCTIVITY; TRANSITION TEMPERATURE; TYPE-II SUPERCONDUCTORS
Descriptors DEC
ALLOYS; CHEMICAL ANALYSIS; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; ELEMENTS; NIOBIUM ALLOYS; NONDESTRUCTIVE ANALYSIS; NONMETALS; PHYSICAL PROPERTIES; SCATTERING; SUPERCONDUCTORS; SYNTHESIS; THERMODYNAMIC PROPERTIES; TRANSITION ELEMENT ALLOYS

Optional Information

Notes
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