Published August 30, 2014 | Version v1
Journal article

Transport properties of polycrystalline boron doped diamond

  • 1. Instituto Nacional de Pesquisas Espaciais, INPE/LAS, S.J. Campos, SP 12227-010 (Brazil)
  • 2. Universidade Estadual Paulista, UNESP Departamento de Física, Guaratinguetá 12.516-410 (Brazil)
  • 3. Instituto Federal de Educação, Ciência e Tecnologia de São Paulo, Bragança Paulista 12929-600 (Brazil)
  • 4. Universidade Federal de São Carlos, Departamento de Física, São Carlos 13565-905 (Brazil)

Description

Highlights: • Synthetic boron doped diamond films were grown by hot filament chemical vapor deposition. • We characterized the films by hall effects as a function of temperature and magnetic field. • The resistivity was investigated. • The conduction mechanism was dominated by variable range hopping (VRH). - Abstract: The influence of doping level in the electronic conductivity and resistivity properties of synthetic diamond films grown by hot filament chemical vapor deposition (HFCVD) was investigated. Eight different doping level concentrations varied from 500 to 30,000 ppm were considered. The polycrystalline morphology observed by scanning electron microscopy and Raman spectra was strongly affected by the addition of boron. The electric characterization by Hall effect as a function of temperature and magnetic field showed that at sufficiently low temperatures, electrical conduction is dominated by variable range hopping (VRH) conducting process. The resistivity was also investigated by temperature-dependent transport measurements in order to investigate the conduction mechanism in the doped samples. The samples exhibited the VRH (m = 1/4) mechanism in the temperature range from 77 to 300 K. The interface between metal, and our HFCVD diamond was also investigated for the lower doped samples

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2014.04.161

Additional details

Identifiers

DOI
10.1016/j.apsusc.2014.04.161;
PII
S0169-4332(14)00937-4;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
311
Journal Page Range
p. 5-8
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.