Published April 2011 | Version v1
Journal article

Local atomic and electronic structure analysis of surfaces and thin films by photoelectron diffraction spectroscopy

  • 1. Nara Institute of Science and Technology, Ikoma, Nara (Japan)
  • 2. Japan Synchrotron Radiation Research Institute (JASRI/SPring-8), Sayo, Hyogo (Japan)

Description

Photoelectron and Auger electron diffractions from a localized core level provide information on atomic configurations. X-ray photoelectron and X-ray absorption spectroscopy are powerful analysis tools for the electronic and magnetic structures of surfaces. Taking advantage of the diffraction signals as an excellent element- and site-selective probe, diffraction spectroscopy enables direct access to the electronic and magnetic structures at subsurface region and disentanglement of the spectra from different atomic layers. We have applied this method to the investigation of the electronic and magnetic structures of Ni thin film at atomic level. (author)

Additional details

Publishing Information

Journal Title
Shokubai
Journal Volume
53
Journal Issue
3
Journal Page Range
p. 173-177
ISSN
0559-8958

Optional Information

Notes
26 refs., 7 figs.