Published March 2010
| Version v1
Journal article
Ptychographic characterization of the wavefield in the focus of reflective hard X-ray optics
Creators
- 1. Paul Scherrer Institut, CH-5232 Villigen PSI (Switzerland)
- 2. Technische Universitaet Muenchen, D-85748 Garching (Germany)
- 3. EMPA, CH-8600 Duebendorf (Switzerland)
Description
A technique for quantitatively characterizing the complex-valued focal wavefield of arbitrary optics is described and applied to reconstructing the coherent focused beam produced by a reflective/diffractive hard X-ray mirror. This phase-retrieval method, based on ptychography, represents an important advance in X-ray optics characterization because the information obtained and potential resolution far exceeds that accessible to methods of directly probing the focus. Ptychography will therefore be well-suited for characterizing and aligning future nanofocusing X-ray optics.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.ultramic.2010.01.004Additional details
Identifiers
- DOI
- 10.1016/j.ultramic.2010.01.004;
- PII
- S0304-3991(10)00007-0;
Publishing Information
- Journal Title
- Ultramicroscopy (Amsterdam)
- Journal Volume
- 110
- Journal Issue
- 4
- Journal Page Range
- p. 325-329
- ISSN
- 0304-3991
- CODEN
- ULTRD6
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44102711
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ALIGNMENT; BEAM OPTICS; BRAGG REFLECTION; HARD X RADIATION; MIRRORS; RESOLUTION; X-RAY DIFFRACTION; X-RAY DIFFRACTOMETERS
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; DIFFRACTOMETERS; ELECTROMAGNETIC RADIATION; IONIZING RADIATIONS; MEASURING INSTRUMENTS; RADIATIONS; REFLECTION; SCATTERING; X RADIATION
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.