Published March 2010 | Version v1
Journal article

Ptychographic characterization of the wavefield in the focus of reflective hard X-ray optics

  • 1. Paul Scherrer Institut, CH-5232 Villigen PSI (Switzerland)
  • 2. Technische Universitaet Muenchen, D-85748 Garching (Germany)
  • 3. EMPA, CH-8600 Duebendorf (Switzerland)

Description

A technique for quantitatively characterizing the complex-valued focal wavefield of arbitrary optics is described and applied to reconstructing the coherent focused beam produced by a reflective/diffractive hard X-ray mirror. This phase-retrieval method, based on ptychography, represents an important advance in X-ray optics characterization because the information obtained and potential resolution far exceeds that accessible to methods of directly probing the focus. Ptychography will therefore be well-suited for characterizing and aligning future nanofocusing X-ray optics.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2010.01.004

Additional details

Identifiers

DOI
10.1016/j.ultramic.2010.01.004;
PII
S0304-3991(10)00007-0;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
110
Journal Issue
4
Journal Page Range
p. 325-329
ISSN
0304-3991
CODEN
ULTRD6

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.