Published February 2021 | Version v1
Journal article

Influences of hydrogen ion irradiation on NcVsi formation in 4H-silicon carbide

  • 1. Saitama University, Graduate School of Science and Engineering, Saitama (Japan)
  • 2. National Institutes for Quantum and Radiological Science and Technology (QST), Takasaki, Gunma (Japan)
  • 3. National Institute of Advanced Industrial Science and Technology (AIST), Tukuba, Ibaraki (Japan)

Description

Nitrogen-vacancy (NCVSi) center in 4H-SiC is spin defect with near-infrared luminescence at room temperature and a promising candidate for quantum technologies. This paper reports on NCVSi center formation in N-doped 4H-SiCs by hydrogen ion irradiation and subsequent thermal annealing. It is revealed photoluminescence for NCVSi centers suddenly appears above the fluence of 5.0 × 1015 cm−2 when annealed at 1000 °C. Appearance of a threshold fluence for their formation and/or activation has not been observed for other energetic particle irradiations. The possible mechanism is discussed based on the kinetics of hydrogen-related complexes and the majority carrier depletion caused by irradiation induced damage. (author)

Availability note (English)

Available from DOI: https://doi.org/10.35848/1882-0786/abdc9e

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Express (Online)
Journal Volume
14
Journal Issue
2
Journal Page Range
p. 021004.1-021004.4
ISSN
1882-0786

Optional Information

Notes
26 refs., 3 figs.