Published January 1, 2005
| Version v1
Journal article
Patterning of thick polymeric substrates for the fabrication of microfluidic devices
- 1. Institute of Microelectronics, NCSR 'Demokritos', POB 60228, 15310 Aghia Paraskevi (Greece)
Description
Plasma etching is investigated as an alternative technology to soft lithography for the fabrication of microfluidic devices. First, soft lithography was employed for the fabrication of microchannels in poly-dimethylsiloxane (PDMS), for use in a biosensor for protein and DNA detection. Then, a plasma etching process was investigated and optimized with respect to etch rate maximization for PDMS and PMMA substrates. Preliminary results for deep pattern transfer to these polymeric substrates with an Al etch mask are shown
Availability note (English)
Available online at http://stacks.iop.org/1742-6596/10/293/jpconf5_10_072.pdf or at the Web site for the Journal of Physics. Conference Series (Online) (ISSN 1742-6596) http://www.iop.org/Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 10
- Journal Issue
- 1
- Journal Page Range
- p. 293-296
- ISSN
- 1742-6596
Conference
- Title
- 2. conference on microelectronics, microsystems and nanotechnology
- Dates
- 14-17 Nov 2004
- Place
- Athens (Greece)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36107966
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- DETECTION; DNA; EQUIPMENT; ETCHING; FABRICATION; MICROSTRUCTURE; PLASMA; PMMA; PROTEINS; SUBSTRATES
- Descriptors DEC
- ESTERS; NUCLEIC ACIDS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; POLYACRYLATES; POLYMERS; POLYVINYLS; SURFACE FINISHING