Cathodoluminescence and epitaxy after group-IV and alkali-ion implantation in α-quartz

Ion implantation is a promising route for doping quartz with luminescent impurity atoms and nanoparticles at moderate fluences. The present work focuses on the comparison of epitaxy and cathodoluminescence (CL) after Ba, Ge, Na and Rb ion implantation as well as Rb/Ge double implantation in α-quartz, under the conditions of either dynamic or chemical epitaxy. In addition to the known intrinsic sub-bands in the CL spectra, due to the silica matrix or electron irradiation, we were able to line up several new blue or violet bands with the implanted ion species and follow their thermal behaviour. In the case of Na and Rb ions, complete chemical epitaxy has been achieved, but only rather weak CL output. For Ba ions, almost complete dynamic epitaxy and fairly high CL efficiency have been realized, but no epitaxy for Ge implantation. The case of dual Rb/Ge ion implantation appears as the most promising route to gain a high CL light output and full epitaxy