Published April 2018
| Version v1
Journal article
Electron irradiation degradation of AlGaInP/GaAs light-emitting diodes
- 1. National Research Tomsk State University, Tomsk (Russian Federation)
- 2. National Research Nuclear University MEPhi, Moscow (Russian Federation)
- 3. F.M. Stelmakh Research Institute ''Polyus'', Moscow (Russian Federation)
Description
Red and yellow AlGaInP/GaAs light-emitting diodes (LEDs) with multiple quantum wells grown by the metalorganic chemical vapor deposition technique were irradiated at room temperature by 10 MeV electrons at fluences of 1012 - 1016 cm-2. The damage constants of the minority carrier lifetime and the light-output reach the values of (1-2.5) x 10-14 cm2 at room temperature measurements. At the same time, the radiation tolerance of these diodes increases up to 50 times when the temperature is lowered down to 16 K. The beneficial effect of the Mg doping of the p-GaP(Mg) window layer on the LEDs radiation tolerance at a high forward current density has been demonstrated. (copyright 2018 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)
Availability note (English)
Available from: http://dx.doi.org/10.1002/pssa.201700445Additional details
Identifiers
Publishing Information
- Journal Title
- Physica Status Solidi A. Applications and Materials Science (Online)
- Journal Volume
- 215
- Journal Issue
- 8
- Journal Page Range
- p. 1-5
- ISSN
- 1862-6319
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 49060545
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM PHOSPHIDES; CARRIER DENSITY; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; DOPED MATERIALS; ELECTRON BEAMS; GALLIUM ARSENIDES; GALLIUM PHOSPHIDES; HETEROJUNCTIONS; INDIUM PHOSPHIDES; LIGHT EMITTING DIODES; MAGNESIUM ADDITIONS; MEV RANGE 01-10; ORGANOMETALLIC COMPOUNDS; RADIATION EFFECTS; TEMPERATURE RANGE 0273-0400 K; THICKNESS; THIN FILMS; VAPOR PHASE EPITAXY
- Descriptors DEC
- ALLOYS; ALUMINIUM COMPOUNDS; ARSENIC COMPOUNDS; ARSENIDES; BEAMS; CHEMICAL COATING; CRYSTAL GROWTH METHODS; DEPOSITION; DIMENSIONS; ENERGY RANGE; EPITAXY; FILMS; GALLIUM COMPOUNDS; INDIUM COMPOUNDS; LEPTON BEAMS; MAGNESIUM ALLOYS; MATERIALS; MEV RANGE; ORGANIC COMPOUNDS; PARTICLE BEAMS; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SEMICONDUCTOR JUNCTIONS; SURFACE COATING; TEMPERATURE RANGE
Optional Information
- Notes
- With 9 figs., 1 tab.