Published February 2014 | Version v1
Journal article

Controlling precise magnetic field configuration around electron cyclotron resonance zone for enhancing plasma parameters and beam current

  • 1. Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871 (Japan)

Description

Multi-charged ion source which has wide operating conditions is required in various application fields. We have constructed tandem type ECR ion source (ECRIS); one of the features of its main stage is an additional coil for controlling magnetic field distribution around the mirror bottom precisely. Here the effect of magnetic field variation caused by the additional coil is experimentally considered in terms of plasma parameters and beam current as the first investigation of the main stage plasma. Furthermore, behavior of magnetic lines of force flowing from the ECR zone is calculated, and is compared with measurement results aiming for better understanding of interrelationship between plasma production and ion beam generation on the ECRIS

Additional details

Identifiers

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
85
Journal Issue
2
Journal Page Range
vp.
ISSN
0034-6748
CODEN
RSINAK

Conference

Title
14. international conference on ion sources
Acronym
ICIS 2011
Dates
12-16 Sep 2011
Place
Giardini-Naxos, Sicily (Italy)

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45074937
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S43: PARTICLE ACCELERATORS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BEAM CURRENTS; ECR ION SOURCES; ELECTRON CYCLOTRON-RESONANCE; MAGNETIC FIELD CONFIGURATIONS; MAGNETIC FIELDS; MULTICHARGED IONS; PLASMA PRODUCTION
Descriptors DEC
CHARGED PARTICLES; CURRENTS; CYCLOTRON RESONANCE; ION SOURCES; IONS; RESONANCE

Optional Information

Notes
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