Published February 2014
| Version v1
Journal article
Controlling precise magnetic field configuration around electron cyclotron resonance zone for enhancing plasma parameters and beam current
Creators
- 1. Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871 (Japan)
Description
Multi-charged ion source which has wide operating conditions is required in various application fields. We have constructed tandem type ECR ion source (ECRIS); one of the features of its main stage is an additional coil for controlling magnetic field distribution around the mirror bottom precisely. Here the effect of magnetic field variation caused by the additional coil is experimentally considered in terms of plasma parameters and beam current as the first investigation of the main stage plasma. Furthermore, behavior of magnetic lines of force flowing from the ECR zone is calculated, and is compared with measurement results aiming for better understanding of interrelationship between plasma production and ion beam generation on the ECRIS
Additional details
Identifiers
- DOI
- 10.1063/1.4827424;
Publishing Information
- Journal Title
- Review of Scientific Instruments
- Journal Volume
- 85
- Journal Issue
- 2
- Journal Page Range
- vp.
- ISSN
- 0034-6748
- CODEN
- RSINAK
Conference
- Title
- 14. international conference on ion sources
- Acronym
- ICIS 2011
- Dates
- 12-16 Sep 2011
- Place
- Giardini-Naxos, Sicily (Italy)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45074937
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM CURRENTS; ECR ION SOURCES; ELECTRON CYCLOTRON-RESONANCE; MAGNETIC FIELD CONFIGURATIONS; MAGNETIC FIELDS; MULTICHARGED IONS; PLASMA PRODUCTION
- Descriptors DEC
- CHARGED PARTICLES; CURRENTS; CYCLOTRON RESONANCE; ION SOURCES; IONS; RESONANCE
Optional Information
- Notes
- (c) 2013 AIP Publishing LLC