Published January 2019 | Version v1
Journal article

Microstructure, properties and formation mechanism of SiO2/SiC nano-coating onto carbon fiber by non-electrode plasma electrolysis

  • 1. Department of Materials Science and Engineering, Beijing Institute of Technology, Beijing 100081 (China)

Description

Recently we have developed a novel non-electrode plasma electrolysis technique in order to rapidly prepare SiO2/SiC nano-coating onto carbon fiber. The surface and cross-sectional microstructures of the SiO2/SiC nano-coating were systematically investigated. The nano-coating was dense and roughly uniform, mainly composed of amorphous SiO2, where a small amount of SiC was distributed. A superior bonding was observed between the nano-coating and the fiber substrate. The cross-sectional TEM revealed ∼80 nm in the thickness for the coating. The SiO2/SiC nano-coating significantly reduced the oxidation rate with the burn-out temperature increasing from 880 °C to 1250 °C. It was proposed that the heat evolution, mechanical effect and plasma chemical reactions had a critical effect on the formation of the nano-coating. We believe that the novel non-electrode plasma electrolysis technique will find a wide range of applications in modifying the interface of carbon fiber reinforced composite materials.

Additional details

Identifiers

DOI
10.1016/j.jallcom.2018.09.221;
PII
S0925838818334613;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
773
Journal Page Range
p. 346-351
ISSN
0925-8388
CODEN
JALCEU

INIS

Country of Publication
Switzerland
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
55067675
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CARBON FIBERS; COATINGS; COMPOSITE MATERIALS; ELECTROLYSIS; MICROSTRUCTURE; PLASMA; SILICON CARBIDES; SILICON OXIDES
Descriptors DEC
CARBIDES; CARBON COMPOUNDS; CHALCOGENIDES; FIBERS; LYSIS; MATERIALS; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS

Optional Information

Copyright
Copyright (c) 2018 Elsevier B.V. All rights reserved.