Published August 1975 | Version v1
Journal article

Characteristic and noncharacteristic x rays produced during 1-MeV argon bombardment of silicon

  • 1. IBM Thomas J.Watson Research Center, Yorktown Heights, New York 10598

Description

This work reports the first detailed examination of the noncharacteristic x-ray distribution produced during 1-MeV Ar bombardment of silicon. A crystal spectrometer was used to observe the characteristic and noncharacteristic x rays. It is shown that to within 5 eV the noncharacteristic x-ray band is continuous and tails off in the region of 1.4 keV, as required by the molecular x-ray interpretation. We have obtained the true shape of the noncharacteristic x-ray band in the energy range 675--1550 keV by using a rubidium acid phthalate crystal spectrometer calibrated for its relative efficiency. The observation of a broadened argon L line spectrum and multiple satellite line in the Si K spectrum shows that a high degree of excitation is produced in the L shells of both argon and silicon during the collision

Additional details

Identifiers

Publishing Information

Journal Title
Physical Review A
Journal Volume
12
Journal Issue
2
Series
Phys. Rev., A.
Journal Page Range
498-501
ISSN
0556-2791

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
7227892
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ARGON IONS; COLLISIONS; ENERGY RANGE; MEV RANGE; SILICON; TARGETS; X-RAY SPECTRA
Descriptors DEC
CHARGED PARTICLES; ELEMENTS; IONS; SEMIMETALS; SPECTRA

Optional Information

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