Characteristic and noncharacteristic x rays produced during 1-MeV argon bombardment of silicon
- 1. IBM Thomas J.Watson Research Center, Yorktown Heights, New York 10598
Description
This work reports the first detailed examination of the noncharacteristic x-ray distribution produced during 1-MeV Ar bombardment of silicon. A crystal spectrometer was used to observe the characteristic and noncharacteristic x rays. It is shown that to within 5 eV the noncharacteristic x-ray band is continuous and tails off in the region of 1.4 keV, as required by the molecular x-ray interpretation. We have obtained the true shape of the noncharacteristic x-ray band in the energy range 675--1550 keV by using a rubidium acid phthalate crystal spectrometer calibrated for its relative efficiency. The observation of a broadened argon L line spectrum and multiple satellite line in the Si K spectrum shows that a high degree of excitation is produced in the L shells of both argon and silicon during the collision
Additional details
Identifiers
Publishing Information
- Journal Title
- Physical Review A
- Journal Volume
- 12
- Journal Issue
- 2
- Series
- Phys. Rev., A.
- Journal Page Range
- 498-501
- ISSN
- 0556-2791
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 7227892
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ARGON IONS; COLLISIONS; ENERGY RANGE; MEV RANGE; SILICON; TARGETS; X-RAY SPECTRA
- Descriptors DEC
- CHARGED PARTICLES; ELEMENTS; IONS; SEMIMETALS; SPECTRA
Optional Information
- Notes
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