Published October 1986
| Version v1
Journal article
Ion-assisted thin film deposition and applications
Creators
- 1. Commonwealth Scientific and Industrial Research Organization, Sydney (Australia). Div. of Applied Physics
Description
Some general aspects of ion-surface interactions and their relation to ion-assisted deposition (IAD) are discussed. Applications of IAD are reviewed with emphasis on the improvement of the optical properties of dielectric films. IAD is seen to be a useful technique for increasing refractive indices and stabilizing the optical properties of dielectric oxides and other optical materials. (author)
Additional details
Publishing Information
- Journal Title
- Vacuum
- Journal Volume
- 36
- Journal Issue
- 10
- Series
- Vacuum.
- Journal Page Range
- 585-590
- ISSN
- 0042-207X
- CODEN
- VACUA
Conference
- Title
- Conference on vacuum, electron and ion technologies.
- Dates
- 7-11 Oct 1985.
- Place
- Sozopol (Bulgaria).
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 18033843
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COATINGS; DIELECTRIC MATERIALS; ION BEAMS; MICROSTRUCTURE; PRESSURE DEPENDENCE; REFRACTIVE INDEX; SURFACE COATING; SURFACE PROPERTIES; TEMPERATURE DEPENDENCE; THIN FILMS
- Descriptors DEC
- BEAMS; CRYSTAL STRUCTURE; DEPOSITION; FILMS; MATERIALS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES