The emission of atomic and molecular ions under single and multiple-charged rare gas ion bombardment of LiF, KCl, SiC

In this paper the sputtering of ionic crystals in the form of positive ions under bombardment by multiple-charged ions of Ar and Kr with charge q=1-6 is studied. It is shown that the number of sputtered atoms increases with increase of the charge q and the energy of bombarding particles E0, and the number of sputtered molecules is slightly changed. It has been found that the potential energy of an ion stimulates the sputtering of 1-2 layers beneath the surface. The results obtained are discussed in the frame of the ideas about the dependence of binding energy of a surface atom on the charge of a bombarding ion. (orig.)