Published November 10, 2008
| Version v1
Journal article
Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films
- 1. Department of Materials and Optoelectronic Science, Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung 804, Taiwan (China)
- 2. Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996 (United States)
Description
Ternary Zr-Cu-Ti system, especial with a high Ti content, is normally difficult to be fully vitrified. In this paper, we demonstrate that cosputtering can produce amorphous Zr-Cu-Ti thin films with an excessive Ti content even as high as 19%. Sub-Tg annealing of the film induces the formation of medium-range-ordered clusters and to raise the nanohardness by 35% to 6.6 GPa. The promising mechanical properties of the sub-Tg annealed Zr52Cu29Ti19 films offer great potential for microelectromechanical system applications
Additional details
Identifiers
- DOI
- 10.1063/1.2999592;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 93
- Journal Issue
- 19
- Journal Page Range
- p. 191901-191901.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40051126
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- AMORPHOUS STATE; ANNEALING; COPPER ALLOYS; HARDNESS; INTERMETALLIC COMPOUNDS; METALLIC GLASSES; NANOSTRUCTURES; PRESSURE RANGE GIGA PA; SPUTTERING; TERNARY ALLOY SYSTEMS; THIN FILMS; TITANIUM ALLOYS; VITRIFICATION; ZIRCONIUM ALLOYS
- Descriptors DEC
- ALLOY SYSTEMS; ALLOYS; FILMS; HEAT TREATMENTS; MECHANICAL PROPERTIES; PRESSURE RANGE; TRANSITION ELEMENT ALLOYS
Optional Information
- Notes
- (c) 2008 American Institute of Physics