Published February 4, 2009 | Version v1
Journal article

Direct patterning of zinc oxide with control of reflected color through nano-oxidation using an atomic force microscope

  • 1. Institute of Optoelectronic Sciences, National Taiwan Ocean University, Keelung, Taiwan (China)
  • 2. Department of Electrical Engineering, National Taiwan Ocean University, Keelung, Taiwan (China)
  • 3. Department of Applied Sciences, National Taitung University, Taitung, Taiwan (China)
  • 4. Department of Mechanical Engineering, Chung Yuan Christian University, Chunli, Taiwan (China)

Description

Atomic force microscope oxidation on Zn creating amorphous ZnO (a-ZnO) with the a-ZnO showing multiple colors under white light at different oxidation voltages was successfully demonstrated. Simulation of reflected colors at different thicknesses of a-ZnO was also conducted. The presented technique can not only be applied to near diffraction limit multilevel optical data storage, but also makes it possible to represent the color spectra observed in nature at near diffraction limits. It can also be used for device fabrication in situations exploiting the semiconductor nature of ZnO.

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/20/5/055302

Additional details

Identifiers

DOI
10.1088/0957-4484/20/5/055302;
PII
S0957-4484(09)94457-9;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
20
Journal Issue
5
Journal Page Range
[4 p.]
ISSN
0957-4484