Published May 1989
| Version v1
Report
The spectroscopic study of SiCl4 in 400 kHz low pressure plasma etch reactor
Description
The low-pressure high-frequency SiCl4 discharge was studied spectroscopically in the range of 250-610 nm by means of the SPM-2 monochromator (Zeiss Jena). The typical discharge spectrum is presented and the observed and missing emission lines are identified. Discussed are some features of kinetics of the gas-phase processes which may be deduced from the experimental data. The physical mechanism responsible for two broad emission bands observed around 400 nm and 575 nm, however, remains unknown. (J.U.)
Additional details
Publishing Information
- Imprint Title
- 15th Czechoslovak seminar on plasma physics and technology. Part 1
- Imprint Pagination
- 159 p.
- Journal Page Range
- p. 112-115.
- Report number
- IPPCZ--293/I
Conference
- Title
- 15. Czechoslovak seminar on plasma physics and technology.
- Dates
- 13-17 Mar 1989.
- Place
- Liblice (Czechoslovakia).
INIS
- Country of Publication
- Serbia and Montenegro
- Country of Input or Organization
- Serbia and Montenegro
- INIS RN
- 21037976
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COLD PLASMA; EMISSION SPECTRA; EMISSION SPECTROSCOPY; ENERGY-LEVEL TRANSITIONS; HIGH-FREQUENCY DISCHARGES; KHZ RANGE 100-1000; MEDIUM VACUUM; SILICON CHLORIDES
- Descriptors DEC
- CHLORIDES; CHLORINE COMPOUNDS; ELECTRIC DISCHARGES; FREQUENCY RANGE; HALIDES; HALOGEN COMPOUNDS; KHZ RANGE; PLASMA; SILICON COMPOUNDS; SPECTRA; SPECTROSCOPY