Properties of electrophoretically deposited single wall carbon nanotube films
Description
This paper describes techniques for rapidly producing a carbon nanotube thin film by electrophoretic deposition at room temperature and determines the film mass density and electrical/mechanical properties of such films. The mechanism of electrophoretic deposition of thin layers is explained with experimental data. Also, film thickness is measured as a function of time, electrical field and suspension concentration. We use Rutherford backscattering spectroscopy to determine the film mass density. Films created in this manner have a resistivity of 2.14 × 10−3 Ω·cm, a mass density that varies with thickness from 0.12 to 0.54 g/cm3, and a Young's modulus between 4.72 and 5.67 GPa. The latter was found to be independent of thickness from 77 to 134 nm. We also report on fabricating free-standing films by removing the metal seed layer under the CNT film, and selectively etching a sacrificial layer. This method could be extended to flexible photovoltaic devices or high frequency RF MEMS devices. - Highlights: • We explain the electrophoretic deposition process and mechanism of thin SWCNT film deposition. • Characterization of the SWCNT film properties including density, resistivity, transmittance, and Young's modulus. • The film density and resistivity are found to be a function of the film thickness. • Techniques developed to create free standing layers of SW-CNTs for flexible electronics and mechanical actuators
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2015.05.042Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2015.05.042;
- PII
- S0040-6090(15)00576-3;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 589
- Journal Page Range
- p. 278-285
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47033464
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- CARBON NANOTUBES; DENSITY; DEPOSITION; ELECTROPHORESIS; LAYERS; MASS; MEMS; METALS; PHOTOVOLTAIC EFFECT; PRESSURE RANGE GIGA PA; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUSPENSIONS; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TIME DEPENDENCE
- Descriptors DEC
- CARBON; DISPERSIONS; ELEMENTS; FILMS; NANOSTRUCTURES; NANOTUBES; NONMETALS; PHOTOELECTRIC EFFECT; PHYSICAL PROPERTIES; PRESSURE RANGE; SPECTROSCOPY; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.