Contrast in supervoltage electron microscopy in bright-field imaging
Creators
- 1. Presidency Coll., Calcutta (India). Dept. of Physics
- 2. Calcutta Univ. (India). Dept. of Physics
Description
The variation of the total scattering cross-section with the accelerating voltage of the electron beam in the range 100 KV to 1 MV has been given for various aperture angles of the objective lens and for amorphous films of five different elements giving rise to the scattering. The calculations are based on the single scattering theory of Lenz. A method has been described for the estimation of contrast in supervoltage microscopy of thin films of any element at any specified voltage and aperture angle, using the bright-field mode of operation. Conversely, the method can also be utilised for deducing the cross-section from the measured contrast of the electron microscopic image. A comparison has been made between the theoretically estimated cross-sections and those deduced experimentally. (author)
Additional details
Publishing Information
- Journal Title
- Proc. Indian Natl. Sci. Acad., Part A
- Journal Volume
- 46
- Journal Issue
- 5
- Series
- Proc. Indian Natl. Sci. Acad., Part A.
- Journal Page Range
- 448-455
- ISSN
- 0370-0046
INIS
- Country of Publication
- India
- Country of Input or Organization
- India
- INIS RN
- 13651307
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- APERTURES; ELECTRON BEAMS; ELECTRON MICROSCOPES; FABRICATION; FILMS; IMAGE SCANNERS; LENSES; SCATTERING; SPECIFICATIONS; THICKNESS; TOTAL CROSS SECTIONS
- Descriptors DEC
- BEAMS; CROSS SECTIONS; DIMENSIONS; LEPTON BEAMS; MICROSCOPES; OPENINGS; PARTICLE BEAMS
Optional Information
- Notes
- 6 refs., 4 figures.