Published May 1994 | Version v1
Journal article Metadata-only

The Luch-2000 inductively coupled plasma source for emission spectral analysis

Creators

  • 1. S.I. Vavilov State Optical Institute, St. Petersburg (Russian Federation)

Description

The design, operating parameters and possibilities for the analytical application of an inductively coupled plasma (ICP) source produced by Eridan MVP, St. Petersburg, are investigated. The convenient layout of the source makes it possible to use it in a complex with practically any domestic and foreign emission spectrometers. 9 refs., 3 figs., 1 tab

Additional details

Publishing Information

Journal Title
Journal of Optical Technology
Journal Volume
61
Journal Issue
5
Journal Page Range
p. 408-411.
ISSN
1070-9762
CODEN
JOTEE4

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
27016077
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S42: ENGINEERING;
Resource subtype / Literary indicator
Translation
Descriptors DEI
ATOMIZATION; DESIGN; EMISSION SPECTROSCOPY; OPERATION; OPTICAL SPECTROMETERS; PLASMA PRODUCTION
Descriptors DEC
MEASURING INSTRUMENTS; SPECTROMETERS; SPECTROSCOPY

Optional Information

Notes
Translated from Opticheskii Zhurnal; 61, 53-56(May 1994).