Published September 28, 2015
| Version v1
Journal article
Transfer-free synthesis of highly ordered Ge nanowire arrays on glass substrates
- 1. Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573 (Japan)
- 2. National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044 (Japan)
- 3. Electron Microscope Facility, TIA, AIST, 16-1 Onogawa, Tsukuba 305-8569 (Japan)
Description
Vertically aligned Ge nanowires (NWs) are directly synthesized on glass via vapor-liquid-solid (VLS) growth using chemical-vapor deposition. The use of the (111)-oriented Ge seed layer, formed by metal-induced crystallization at 325 °C, dramatically improved the density, uniformity, and crystal quality of Ge NWs. In particular, the VLS growth at 400 °C allowed us to simultaneously achieve the ordered morphology and high crystal quality of the Ge NW array. Transmission electron microscopy demonstrated that the resulting Ge NWs had no dislocations or stacking faults. Production of high-quality NW arrays on amorphous insulators will promote the widespread application of nanoscale devices
Additional details
Identifiers
- DOI
- 10.1063/1.4932054;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 107
- Journal Issue
- 13
- Journal Page Range
- p. 133102-133102.4
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47052156
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; CRYSTALS; DENSITY; DISLOCATIONS; GLASS; NANOWIRES; STACKING FAULTS; SUBSTRATES; SYNTHESIS; TRANSMISSION ELECTRON MICROSCOPY; VAPORS
- Descriptors DEC
- CHEMICAL COATING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DEPOSITION; ELECTRON MICROSCOPY; FLUIDS; GASES; LINE DEFECTS; MICROSCOPY; NANOSTRUCTURES; PHASE TRANSFORMATIONS; PHYSICAL PROPERTIES; SURFACE COATING
Optional Information
- Notes
- (c) 2015 AIP Publishing LLC