Published April 4, 2001
| Version v1
Journal article
Simple approximation for plasma microfield distribution
Creators
- 1. Institute for Mathematical Modelling, Miusskaya sq. 4-A, Moscow 125047 (Russian Federation)
Description
Ionic microfield in plasmas depends strongly on electronic subsystem of plasmas. Two models for electrons influence are examined in this article: 1) uniform neutralizing background of electrons, 2) so-called low-frequency component of microfield. Simple analytic approximations for ionic microfield distribution in these two models are constructed. These approximations are suitable for plasmas with complex composition in wide range of densities and temperatures
Additional details
Identifiers
- DOI
- 10.1063/1.1370617;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 559
- Journal Issue
- 1
- Journal Page Range
- p. 179-184
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 15. ICSLS international conference on spectral line shapes
- Dates
- 10-14 Jul 2000
- Place
- Berlin (Germany)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35051625
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference, Numerical Data
- Descriptors DEI
- ELECTRON DENSITY; ELECTRON TEMPERATURE; ELECTRONS; EXPERIMENTAL DATA; ION TEMPERATURE; IONS; PLASMA; PLASMA DENSITY; PLASMA SIMULATION
- Descriptors DEC
- CHARGED PARTICLES; DATA; ELEMENTARY PARTICLES; FERMIONS; INFORMATION; LEPTONS; NUMERICAL DATA; SIMULATION
Optional Information
- Notes
- (c) 2001 American Institute of Physics.