Hard and elastic amorphous carbon nitride thin films studied by 13C nuclear magnetic resonance spectroscopy
- 1. Department of Physics, College of William and Mary, P.O. Box 8795, Williamsburg, Virginia 23187 (United States)
- 2. Department of Applied Science, College of William and Mary, P.O. Box 8795, Williamsburg, Virginia 23187 (United States)
- 3. Max-Planck-Institut fuer Metallforschung, Stuttgart (Germany)
Description
The chemical bonding of hard and elastic amorphous carbon nitride (a-CNx) thin films was examined using solid-state 13C NMR spectroscopy. The films were deposited by DC magnetron sputtering in a pure nitrogen discharge on Si(001) substrates at 300 deg. C. Nanoindentation tests reveal a recovery of 80%, a hardness of 5 GPa, and an elastic modulus of 47 GPa. This combination of low modulus and high strength means the material can be regarded as hard and elastic; the material gives when pressed on and recovers its shape when the load is released. The 13C NMR results conclusively demonstrate that hard and elastic a-CNx has an sp2 carbon bonded structure and that sp3 hybridized carbons are absent. Our results stand in contrast with earlier work that proposed that the interesting mechanical properties of hard and elastic a-CNx were due, in part, to sp3 bonded carbon
Additional details
Identifiers
Publishing Information
- Journal Title
- Physical Review. B, Condensed Matter and Materials Physics
- Journal Volume
- 66
- Journal Issue
- 15
- Journal Page Range
- p. 153402-153402.4
- ISSN
- 1098-0121
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36009533
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Descriptors DEI
- AMORPHOUS STATE; CARBON NITRIDES; CHEMICAL BONDS; DEPOSITS; MAGNETRONS; MICROHARDNESS; NITROGEN; NUCLEAR MAGNETIC RESONANCE; PRESSURE RANGE GIGA PA; SPECTROSCOPY; SPUTTERING; THIN FILMS
- Descriptors DEC
- CARBON COMPOUNDS; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; HARDNESS; MAGNETIC RESONANCE; MECHANICAL PROPERTIES; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; PRESSURE RANGE; RESONANCE
Optional Information
- Notes
- (c) 2002 The American Physical Society