Published January 15, 2013 | Version v1
Journal article

Low-dose carbon-implanted planar waveguides in Er3+/Yb3+ co-doped silicate glasses

  • 1. State Key Laboratory of Transient Optics and Photonics, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences (CAS), Xi'an 710119 (China)
  • 2. School of Electronic and Information Engineering, Hefei Normal University, Hefei 230601 (China)
  • 3. Key Laboratory for Organic Electronics and Information Displays (KLOEID) and Institute of Advanced Materials (IAM), Nanjing University of Posts and Telecommunications, Nanjing 210046 (China)
  • 4. Changchun University of Science and Technology, Changchun 130022 (China)

Description

We report, for the first time to our knowledge, on the fabrication of planar waveguides in Er3+/Yb3+ co-doped silicate glasses by 6.0 MeV carbon implantation with a dose of 6.0 × 1014 ions/cm2. The guiding properties are measured by the prism-coupling and end-face coupling methods with a He–Ne beam. The refractive index profile of the planar waveguide is reconstructed by the reflectivity calculation method, which shows a typical "enhanced well + optical barrier" distribution. The micro-luminescence and Raman investigations reveal that the bulk features are not deteriorated significantly by the carbon implantation in the waveguide, exhibiting possible applications for integrated active photonic devices

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2012.11.010

Additional details

Identifiers

DOI
10.1016/j.nimb.2012.11.010;
PII
S0168-583X(12)00729-X;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
295
Journal Page Range
p. 85-88
ISSN
0168-583X
CODEN
NIMBEU

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.