Orientation-dependent phase separation of GaAsSb epilayers grown by gas-source molecular-beam epitaxy
- 1. Graduate Institute of Electronics Engineering, National Taiwan University, Taipei 10617, Taiwan (China)
- 2. Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 10617, Taiwan (China)
Description
This work describes a regular solution model that considers the free energy of the surface monolayer to explain the orientation-dependent phase separation in GaAsSb. In the proposed model, only the interaction between the second nearest-neighboring atoms sitting on the same monolayer contributes to the interaction parameter. Consequently, the parameter reduces to Ω/2 and Ω/3 for (111)B GaAsSb and (100) GaAsSb, where Ω denotes the parameter of bulk GaAsSb. By including the strain effect, the proposed model thoroughly elucidates the immiscibility behavior of (111)B GaAsSb and (100) GaAsSb. - Highlights: ► (111)B GaAsSb exhibits severe phase separation than (100) GaAsSb. ► We propose a model to calculate the monolayer free energy of different planes. ► Monolayer model suggests that (111)B GaAsSb has larger interaction parameter. ► Monolayer model including strain well explains the immiscibility of GaAsSb.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2012.02.024Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2012.02.024;
- PII
- S0040-6090(12)00141-1;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 520
- Journal Issue
- 13
- Journal Page Range
- p. 4486-4492
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43098553
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- FREE ENERGY; INTERACTIONS; MATERIALS; MOLECULAR BEAM EPITAXY; STRAINS; SURFACES
- Descriptors DEC
- CRYSTAL GROWTH METHODS; ENERGY; EPITAXY; PHYSICAL PROPERTIES; THERMODYNAMIC PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.