Optical and structural properties of undoped and palladium doped indium tin oxide films grown by pulsed laser deposition
- 1. Institute of Electronics, Bulgarian Academy of Sciences, 72, Tsarigradsko Chaussee blvd., Sofia 1784 (Bulgaria)
- 2. Department of Engineering Electronics, University Rovira i Virgili, Avda. Paisos Catalans 26 Campus, 43007 Tarragona (Spain)
Description
The purpose of the present investigation is the fabrication of undoped and palladium doped indium tin oxide films by pulsed laser deposition and the analyses of their optical, waveguide and structural properties in view of optical sensor applications. The films are deposited at oxygen pressure from 5 to 20 Pa and substrate temperature between 200 and 450 deg. C. Palladium is used as a dopant since it is critical in improving the sensor's properties. The X-ray diffraction spectra show that all films are polycrystalline with preferential [1 1 1] orientation. The optical transmittance measured in the visible region has maximum values of 85-90% for films grown at oxygen pressure 15 Pa independently of the substrate temperature used. SEM, AFM and optical and investigations revealed that indium tin oxide films with 1 wt.% Pd have higher transmittance and better surface morphology than those with 3 wt.% Pd concentration. ITO films with minimum propagation losses of 2 dB cm-1 were deposited at substrate temperature 200 deg. C and oxygen pressure 5 Pa, but doped ITO films with minimum propagation losses were obtained at 400 deg. C and 15 Pa
Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2007.02.198;
- PII
- S0169-4332(07)00402-3;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 253
- Journal Issue
- 19
- Journal Page Range
- p. 8206-8209
- ISSN
- 0169-4332
- CODEN
- ASUSEE
Conference
- Title
- Photon-assisted synthesis and processing of functional materials
- Acronym
- E-MRS-H Symposium
- Dates
- 29 May - 2 Jun 2006
- Place
- Nice (France)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39003221
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABLATION; ATOMIC FORCE MICROSCOPY; DOPED MATERIALS; ENERGY BEAM DEPOSITION; FABRICATION; FILMS; INDIUM OXIDES; LASER RADIATION; OPTICAL PROPERTIES; OXYGEN; PALLADIUM ADDITIONS; POLYCRYSTALS; PULSED IRRADIATION; SCANNING ELECTRON MICROSCOPY; SPECTRA; SUBSTRATES; SURFACES; TEMPERATURE RANGE 0400-1000 K; TIN ADDITIONS; WAVEGUIDES; X-RAY DIFFRACTION
- Descriptors DEC
- ALLOYS; CHALCOGENIDES; COHERENT SCATTERING; CRYSTALS; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELEMENTS; INDIUM COMPOUNDS; IRRADIATION; MATERIALS; MICROSCOPY; NONMETALS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SURFACE COATING; TEMPERATURE RANGE; TIN ALLOYS
Optional Information
- Copyright
- Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.