Published 1978 | Version v1
Journal article

Specimen contamination in analytical electron microscopy: sources and solutions

Creators

  • 1. Florida Univ., Gainesville (USA)

Description

Sources of contamination and the mechanisms of its growth are discussed. The multitude of factors affecting contamination are illustrated. Working solutions, both proven and hypothetical are described. Irradiation, both in the prepumping and imaging stages, is one of the main factors involved. (C.F.)

Additional details

Publishing Information

Journal Title
Ultramicroscopy
Journal Volume
3
Journal Issue
4
Series
Ultramicroscopy.
Journal Page Range
375-380

Conference

Title
2. Workshop on analytical electron microscopy.
Dates
25 - 28 Jul 1978.
Place
Ithaca, NY, USA.

INIS

Country of Publication
Netherlands
Country of Input or Organization
Netherlands
INIS RN
10482893
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ELECTRON MICROSCOPY; ELECTRONS; IMAGE PROCESSING; IRRADIATION; PHYSICAL RADIATION EFFECTS; POLLUTION
Descriptors DEC
ELEMENTARY PARTICLES; FERMIONS; LEPTONS; MICROSCOPY; RADIATION EFFECTS