Published April 1988 | Version v1
Journal article

A Study on the Thickness Measurement of Thin Film by Ultrasonic Wave

  • 1. Hanyang University, Seoul (Korea, Republic of)

Description

Recently, it is gradually raised necessity that thickness of thin film is measured accurately and managed in industrial circles and medical world. In this study, regarding to the thickness of film which is in opaque object and is beyond distance resolution capacity, thickness measurement was done by MEM-cepstrum analysis of received ultrasonic wave. In measurement results, film thickness which is beyond distance resolution capacity was measured accurately. And within thickness range that don't exist interference, thickness measurement by MEM-ceptrum analysis was impossible

Additional details

Publishing Information

Journal Title
Journal of the Korean Society for Nondestructive Testing
Journal Volume
7
Journal Issue
2
Series
12 refs, 11 figs
Journal Page Range
p. 27-34
ISSN
1225-7842

INIS

Country of Publication
Korea, Republic of
Country of Input or Organization
Korea, Republic of
INIS RN
42102785
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
RESOLUTION; THICKNESS; THIN FILMS; ULTRASONIC WAVES
Descriptors DEC
DIMENSIONS; FILMS; SOUND WAVES