Published 2020
| Version v1
Journal article
Electrical noise in field-effect transistors based on ZnO:Li films
Creators
- 1. Institute for Physical Research NAS, Ashtarak (Armenia)
Description
The noise characteristics of field-effect transistors based on ZnO:Li films obtained by the diffuse technology are studied. The results of an experimental study of the noise characteristics of the drain current are presented, namely, the Random Telegraph Signal and the 1/f-noise. The spectral density of the drain current noises in the low-frequency range (10-5000 Hz) has a classical 1/f dependence. It was found that at low concentrations of the acceptor impurity, 1/f-noise is observed, and with an increase in the acceptor impurity concentration the Random Telegraph Signal prevails
Additional details
Additional titles
- Original title (Russian)
- Електрические шуми в полевих транзисторах на основе плёнок ZnO:Ли
Identifiers
Publishing Information
- Journal Title
- Izvestiya National'noj Akademii Nauk Armenii. Fizika
- Journal Volume
- 55
- Journal Issue
- 2
- Journal Page Range
- p. 228-239
- ISSN
- 1025-5613
INIS
- Country of Publication
- Armenia
- Country of Input or Organization
- Armenia
- INIS RN
- 51094101
- Subject category
- S36: MATERIALS SCIENCE; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- FIELD EFFECT TRANSISTORS; FILMS; LITHIUM; NOISE; SEMICONDUCTOR DEVICES; ZINC OXIDES
- Descriptors DEC
- ALKALI METALS; CHALCOGENIDES; ELEMENTS; METALS; OXIDES; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES; TRANSISTORS; ZINC COMPOUNDS