Published October 1976 | Version v1
Journal article Metadata-only

Oxidation of reaction-sintered nitride

Creators

  • 1. Technische Univ. Berlin (Germany, F.R.). Inst. fuer Nichtmetallische Werkstoffe

Description

Oxidation of reaction-sintered silicon nitride was investigated thermogravimetrically in the temperature range from 700 to 1,6000C. The interpretation of the thermograms is supported by X-ray and scanning electron microscope investigation. A mechanism is suggested for the bubble formation observed at high temperatures. (orig.)

Abstract (German)

Die Oxidation von reaktionsgesintertem Siliciumnitrid wird im Temperaturbereich von 700 bis 1.6000C thermogravimetrisch untersucht. Die Deutung der Thermogramme wird durch roentgenographische und rasterelektronenmikroskopische Aufnahmen gestuetzt. Fuer die beobachtete Blasenbildung bei hohen Temperaturen wird ein Reaktionsmechanismus vorgeschlagen. (orig.)

Additional details

Additional titles

Original title (German)
Oxidation von reaktionsgesintertem Siliciumnitrid

Publishing Information

Journal Title
Ber. Dtsch. Keram. Ges.
Journal Volume
53
Journal Issue
10
Series
Ber. Dtsch. Keram. Ges.
Journal Page Range
349-351

INIS

Country of Publication
Germany
Country of Input or Organization
Germany
INIS RN
8305942
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
BUBBLES; CERAMICS; CRISTOBALITE; ELECTRON MICROSCOPY; MICROSTRUCTURE; OXIDATION; SILICON NITRIDES; SINTERED MATERIALS; THERMAL GRAVIMETRIC ANALYSIS; VERY HIGH TEMPERATURE; X-RAY DIFFRACTION
Descriptors DEC
CHALCOGENIDES; CHEMICAL ANALYSIS; CHEMICAL REACTIONS; COHERENT SCATTERING; CRYSTAL STRUCTURE; DESTRUCTIVE ANALYSIS; DIFFRACTION; GRAVIMETRIC ANALYSIS; MICROSCOPY; MINERALS; NITRIDES; NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; QUANTITATIVE CHEMICAL ANALYSIS; SCATTERING; SILICON COMPOUNDS; SILICON OXIDES; THERMAL ANALYSIS

Optional Information

Notes
6 figs.; 24 refs.