Published January 1984 | Version v1
Journal article Metadata-only

Microwave ion source for high current metal beams

Creators

  • 1. Hitachi Ltd., Kokubunji, Tokyo (Japan). Central Research Lab.

Description

A high current, metal ion source has been developed for application to materials modification in metals and insulators. In a microwave discharge type ion source, even highly reactive materials such as metal halides, as well as oxygen, can be used for source feed materials. The microwave ion source originally developed for conventional semiconductor fabrication has been modified to provide several mA of mass-separated metal ions. So far, ions of Al+, Ga+, Ti+ and Sc+ have been obtained. (author)

Additional details

Publishing Information

Journal Title
Vacuum
Journal Volume
34
Journal Issue
1-2
Series
Vacuum.
Journal Page Range
245-249
ISSN
0042-207X

Conference

Title
Proceedings of the 3. international conference on low energy ion beams.
Dates
28-31 Mar 1983.
Place
Loughborough (UK).

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
15039676
Subject category
S74: ATOMIC AND MOLECULAR PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ALUMINIUM IONS; CRYSTAL DOPING; ELECTRICAL INSULATORS; GALLIUM IONS; HAFNIUM IONS; ION BEAMS; ION IMPLANTATION; ION SOURCES; MICROWAVE RADIATION; MILLI AMP BEAM CURRENTS; SCANDIUM IONS; SEMICONDUCTOR MATERIALS; TITANIUM IONS
Descriptors DEC
ATOMIC IONS; BEAM CURRENTS; BEAMS; CHARGED PARTICLES; CURRENTS; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; EQUIPMENT; IONS; MATERIALS; RADIATIONS