Published January 2006 | Version v1
Journal article Metadata-only

A trend in pulse-powered plasma radiation source

Creators

  • 1. Tokyo Inst. of Technology, Interdisciplinary Graduate School at Suzukakedai, Dept. of Energy Sciences, Yokohama, Kanagawa (Japan)

Description

Recent progress of semiconductor power devices has shifted our interests on pulsed-power energy driver from a huge energetic system to a high-average-power compact generator. Intense extreme ultraviolet radiation sources have been developed using those devices. It is considered that they can be the light sources for microscopy and the next generation microlithography. A trend and a prospect for the pulse powered radiation sources are briefly described. (author)

Additional details

Publishing Information

Journal Title
Denki Gakkai Ronbunshi. A
Journal Volume
126
Journal Issue
1
Journal Page Range
p. 13-14
ISSN
0385-4205

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
37052036
Subject category
S07: ISOTOPES AND RADIATION SOURCES;
Descriptors DEI
COHERENT RADIATION; ENERGY DENSITY; EXTREME ULTRAVIOLET RADIATION; LASERS; MAGNETIC FIELDS; MICROSCOPY; PLASMA; PULSES; RADIATION SOURCES; SOFT X RADIATION
Descriptors DEC
ELECTROMAGNETIC RADIATION; IONIZING RADIATIONS; RADIATIONS; ULTRAVIOLET RADIATION; X RADIATION

Optional Information

Notes
3 refs., 2 figs., 1 tab.