Modification of atomic structure of thin amorphous V2O5 films under UV laser irradiation

Influence of ultra-violet radiation of the KrF laser (wave length 248 nm, pulse duration 20 ns) on atomic structure of amorphous vanadium pentoxide thin films, prepared by the pulsed laser deposition method, is studied. Calculations of the short-range order characteristics (radii and diffusiveness of coordination spheres, coordination numbers) were performed by the Finbak -Warren method. It is established that minimal structure unit of amorphous V2O5 film before and after irradiation is a strongly deformed oxygen octahedron. Distortions of tetragonal pyramids in the initial and modified film are different. Also, oxygen deficiency in a tetragonal pyramid is observed