Published November 7, 2005 | Version v1
Journal article

Effect of Y doping and composition-dependent elastic strain on the electrical properties of (Ba,Sr)TiO3 thin films deposited at 520 deg. C

  • 1. Fujitsu Laboratories Ltd., Atsugi (Japan)
  • 2. Department of Materials Science and Engineering, Stanford University, California (United States)

Description

We demonstrate that large and simultaneous improvements in permittivity, tunability, and leakage current density of (Ba,Sr)TiO3 (BST)-based thin-film capacitors can be achieved by yttrium doping. We have found that, for a low deposition temperature (520 deg. C) sputtering process, Y-doped BST capacitors exhibit tenfold lower leakage current density (<10-9 A/cm2 at 100 KV/cm) and 70% higher permittivity than nominally undoped BST-based capacitors. Furthermore, this work suggests an intriguing correlation between dopant concentration-dependent elastic strain in the films and their enhanced dielectric properties

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
87
Journal Issue
19
Journal Page Range
p. 192906-192906.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2005 American Institute of Physics