Chemical characterization of U3 Si2 alloys by WD-XRF using the fundamental parameters technique

Fundamental Parameters Method allows to calculate the theoretical fluorescent intensities from measured intensities of the elements present in sample, using only the instrumental sensitivity of X-ray fluorescence spectrometer. The proposed method allows the determination of U3 Si2 alloy composition and impurities on a μg/g level as well. The precision and accuracy for U and Si determinations, and the method sensibility for the main important impurities such as Al, Fe, Mg, Cr, Ni, Mn and others are discussed. (author). 5 refs., 1 fig., 3 tabs