Published December 1996 | Version v1
Journal article

Production of stabilized zirconia thin films by physical vapor deposition

  • 1. Chile Univ., Santiago (Chile). Dept. de Energia Electrica
  • 2. Universidad de Santiago de Chile (Chile). Dept. de Fisica
  • 3. Comision Chilena de Energia Nuclear, Santiago (Chile)

Description

no abstract available

Additional details

Publishing Information

Journal Title
Nucleotecnica
Journal Volume
16
Journal Issue
30
Journal Page Range
p. 72.
ISSN
0716-0054
CODEN
NUCLEQ

INIS

Country of Publication
Chile
Country of Input or Organization
Chile
INIS RN
29015716
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
No Abstract
Descriptors DEI
PHYSICAL VAPOR DEPOSITION; SINTERED MATERIALS; STABILITY; THIN FILMS; YTTRIUM OXIDES; ZIRCONIUM OXIDES
Descriptors DEC
CHALCOGENIDES; DEPOSITION; FILMS; MATERIALS; OXIDES; OXYGEN COMPOUNDS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; YTTRIUM COMPOUNDS; ZIRCONIUM COMPOUNDS