Published July 30, 2006 | Version v1
Journal article

Mass accuracy-TOF-SIMS

  • 1. Quality of Life Division, National Physical Laboratory, Teddington, Middlesex TW11 0LW (United Kingdom)

Description

A study is presented of the factors affecting the calibration of the mass scale for time-of-flight SIMS (TOF-SIMS). The effect of the ion kinetic energy, emission angle and other instrumental operating parameters on the measured peak position are determined. This shows clearly why molecular and atomic ions have different relative peak positions and the need for an aperture to restrict ions at large emission angles. A calibration protocol is developed which gives a fractional mass accuracy of better than 10 ppm for masses up to 140 u. The effects of extrapolation beyond the calibration range are discussed and a recommended procedure is given to ensure that accurate mass is achieved within a selectable uncertainty for large molecules

Additional details

Identifiers

DOI
10.1016/j.apsusc.2006.02.096;
PII
S0169-4332(06)00380-1;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
252
Journal Issue
19
Journal Page Range
p. 6591-6593
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
15. International conference on secondary ion mass spectrometry
Acronym
SIMS XV
Dates
12-16 Oct 2005
Place
Manchester (United Kingdom)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38104124
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ACCURACY; ATOMIC IONS; CALIBRATION; EXTRAPOLATION; ION EMISSION; ION MICROPROBE ANALYSIS; KINETIC ENERGY; MASS SPECTROSCOPY; TIME-OF-FLIGHT METHOD
Descriptors DEC
CHARGED PARTICLES; CHEMICAL ANALYSIS; EMISSION; ENERGY; IONS; MATHEMATICAL SOLUTIONS; MICROANALYSIS; NONDESTRUCTIVE ANALYSIS; NUMERICAL SOLUTION; SPECTROSCOPY

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.