Published October 2005
| Version v1
Journal article
Scaling laws for dual radio-frequency capacitively coupled discharges
Creators
- 1. Department of Physics, Dong-A University, Busan 604-714 (Korea, Republic of)
Description
The characteristics of dual radio-frequency capacitively coupled discharges are studied based on a homogeneous analytic model. We are considering a planar plasma device that can be approximated using a one-dimensional model. A set of equations describing the dynamics of the system are presented and used to give the analytic scaling laws. Scaling laws relating the drive frequencies and the applied voltages of dual radio-frequency sources to operating functions such as plasma density and plasma potential are examined and compared with numerical simulations
Additional details
Identifiers
- DOI
- 10.1063/1.2121327;
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 12
- Journal Issue
- 10
- Journal Page Range
- p. 104503-104503.4
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37017406
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- HIGH-FREQUENCY DISCHARGES; ONE-DIMENSIONAL CALCULATIONS; PLASMA; PLASMA DENSITY; PLASMA POTENTIAL; SCALING LAWS
- Descriptors DEC
- ELECTRIC DISCHARGES; ELECTRIC POTENTIAL
Optional Information
- Notes
- (c) 2005 American Institute of Physics