Electrochemical deposition of tungsten-181 without a carrier

This paper investigates the possibility of the electrochemical deposition of microgram quantities of tungsten-181 on a tungsten cathode. It was found that microgram quantities of tungsten-181 in the form of oxide compounds can be deposited in a 50-60% yield from 1-molar hydrochloric acid at a cathodic current density of 20 mA/cm2 in 5-6 h. A similar result was obtained by the internal electrolysis method from 0.5 molar hydrochloric acid. A magnesium plate immersed in 30-50% solution of ammonium chloride was used as the anode. Autoradiographic studies confirmed the uniform distribution of tungsten-181 over the cathode surface