Mass transfer of niobium and copper in binary systems obtained by magnetron sputtering

This paper provides the mutual low–temperature mass transfer in binary systems obtained by magnetron sputtering of niobium onto a heated copper substrate. Based on the kinetic equation of diffusion, the distribution of the niobium through the substrate's depth at temperatures of 100, 200 and 300 °C is calculated. The method of calculating the concentration profiles of niobium, proposed in the manuscript, was verified using experimental data of energy–dispersive analysis. (paper)